Numerical Model to Describe the Growth of the Internal Oxidation Layer in Binary Alloys

Gabriel Plascencia; Torstein A. Utigard; Juliana Gutiérrez; David Jaramillo; Fernando Martínez

doi:10.4028/www.scientific.net/DDF.258-260.282

Paper Titles

Molecular Dynamics Study of Carbon Diffusion in Austenite
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Self- and Impurity Diffusion in γ-TiAl Single Crystals
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Diffusion of Critical Elements in Steel during Thermal Treatments in a Diamond Chemical Vapour Deposition Atmosphere
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Non-Hydrostatic Pressure Induced Structural Phase Transitions of Silicon Analyzed by Raman Scattering
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Numerical Model to Describe the Growth of the Internal Oxidation Layer in Binary Alloys
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Rate of Reduction of Chromium Oxides in a Slag by FeSi and FeMgSi Ferroalloys
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Reactive Diffusion in Cu-Nb-Sn Internal Tin Superconducting Wires for the ITER Project
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Effect of Deformation, Annealing and Doping with Zr on Nb Filaments Nanocrystalline Structure in High-Strength In Situ Cu-Nb Composites
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Diffusion Coefficients of Aqueous Solutions of Carbohydrates as Seen by Taylor Dispersion Technique at Physiological Temperature (37 °C)
p.305

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Numerical Model to Describe the Growth of the Internal Oxidation Layer in Binary Alloys

Abstract:

Several analytical models have been developed through the years to describe the formation and growth of the internal oxidation layer in binary alloys. Such models are often complex and their validity strongly rely on precise measurements of molar fluxes of the different species involved in the oxidation process. The main disadvantage of such measurements is that they are difficult to made and present a high degree of uncertainties, thus some assumptions are needed to ease understanding and the applicability of them. In this paper we set up a numerical scheme (finite differences) to describe the growth of the internal oxidation layer in binary Cu-Al alloys oxidized in air at different temperatures. There is good agreement between the experimental results and the values calculated with the aid of our numerical approach.