Optical Characteristics of Tungsten Oxide Thin Films Prepared by Sputtering Technique

Abstract:

The optical properties of tungsten oxide (WO3) films prepared by DC sputtering on unheated glass substrates with different film thicknesses have been studied. The structural characteristics of the samples were investigated using X-ray diffraction. The optical properties of the prepared films were studied by transmittance and reflectance measurements, and the integrated transmittance (TUV, TVIS, and TNIR) and absorption (AUV, AVIS, and ANIR) in UV, VIS and NIR regions. The integrated UV absorption and transmittance are varied with the film thicknesses, also, no remarkable change in VIS and NIR regions was observed. The dependence of refractive index as well as extinction coefficient on wavelength was also reported. The energy gap was calculated and is located around 3.25 eV.

• Periodical: Defect and Diffusion Forum (Volumes 295-296)
• Pages: 11-17
• DOI: https://doi.org/10.4028/www.scientific.net/DDF.295-296.11
• Online since: January 2010
• Authors: S.A. Aly
• Keywords: DC Sputtering, Optical Property, Thin Film, WO₃, X-Ray Diffraction (XRD)

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