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HomeDefect and Diffusion ForumDefect and Diffusion Forum Vol. 59

Defect and Diffusion Forum Vol. 59

DOI:

https://doi.org/10.4028/www.scientific.net/DDF.59

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Table of Contents

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Paper Title Page

Preface

Point Defects and Diffusion in Silicon and Gallium Arsenide

Authors: U.M. Gösele, T.Y. Tan

1

Diffusion and Low Temperature Deformation by Diffusional Creep of Nanocrystalline Materials

Authors: Rainer Birringer, H.Thomas Hahn, H.J. Höfler, J. Karch, H. Gleiter

17

Dopant and Ion Beam Enhanced Grain Growth in Polycrystalline Silicon Films

Authors: C.V. Thompson

33

Interface Segregation and Cohesion

Authors: C.L. White

47

Oxidation of High Technology Materials

Authors: Jean Philibert

63

Interstitial-Substitutional Diffusion in Group III-V and Group IV Semiconductors: The Role of Dislocations

Authors: Nicolaas Stolwijk, M. Perret, Helmut Mehrer

79

Diffusion Barriers - For Thin Film Metallizations

Authors: S.P. Murarka

99

Contact Metallization for GaAs - A Report on the Development of a Non-Alloyed Ohmic Contact Scheme

Authors: L.C. Wang, F. Fang, E.D. Marshall, S.S. Lau

111

High Density Interconnect for Advanced VLSI Packaging

Authors: A.C. Adams, R.S. Bentson, W.J. Bertram, H.J. Levinstein, W.Q. McKnight, Jacques J. Rubin, B.A. ter Haar

129

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