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HomeKey Engineering MaterialsKey Engineering Materials Vols. 181-182Thickness and Roughness Analysis on YSZ/Si(001)...

Thickness and Roughness Analysis on YSZ/Si(001) Epitaxial Films with Ultra Thin SiO₂ Interface by X-Ray Reflectivity

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Electroceramics in Japan III

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Periodical:

Key Engineering Materials (Volumes 181-182)

Pages:

121-124

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.181-182.121

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Online since:

May 2000

Authors:

Chun Hua Chen, N. Wakiya, Atsushi Saiki, Kazuo Shinozaki, Nobuyasu Mizutani

Keywords:

Reflectivity, Roughness, Silicon, SiO₂, Thickness, X-Ray, YSZ

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© 2000 Trans Tech Publications Ltd. All Rights Reserved

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