Thickness and Roughness Analysis on YSZ/Si(001) Epitaxial Films with Ultra Thin SiO2 Interface by X-Ray Reflectivity

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Periodical:

Key Engineering Materials (Volumes 181-182)

Edited by:

N. Murata, K. Shinozaki and T. Kimura

Pages:

121-124

DOI:

10.4028/www.scientific.net/KEM.181-182.121

Citation:

C. H. Chen et al., "Thickness and Roughness Analysis on YSZ/Si(001) Epitaxial Films with Ultra Thin SiO2 Interface by X-Ray Reflectivity", Key Engineering Materials, Vols. 181-182, pp. 121-124, 2000

Online since:

May 2000

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$35.00

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