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HomeKey Engineering MaterialsKey Engineering Materials Vols. 181-182Preparation and Properties of PbTiO3-PbZrO3 Thin...

Preparation and Properties of PbTiO₃-PbZrO₃ Thin Films by Pulsed MO-Source CVD Method

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Electroceramics in Japan III

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Periodical:

Key Engineering Materials (Volumes 181-182)

Pages:

77-80

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.181-182.77

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Online since:

May 2000

Authors:

A. Endo, Atsushi Iwasaki, N. Wakiya, Atsushi Saiki, Kazuo Shinozaki, Nobuyasu Mizutani

Keywords:

MOCVD, Pulsed MO-Source CVD, PZT, Stress Relaxation, Thin Film

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© 2000 Trans Tech Publications Ltd. All Rights Reserved

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