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HomeKey Engineering MaterialsKey Engineering Materials Vols. 206-213

Key Engineering Materials Vols. 206-213

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.206-213

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Table of Contents

Paper Title Page

Structural Characterization of Amorphous Carbon Nitride Thin Films Prepared by Pulsed Laser Deposition

Authors: Yoshifumi Aoi, Kunio Sakurada, Kojiro Ono, Eiji Kamijo

531

Oxygen Influence on Wetting and Bonding between Copper and Aluminum Nitride

Authors: Thierry Joyeux, Jean Jarrige, J.C. Labbe, J.P. Lecompte, T. Alexandre

535

Formation of TiO₂-SiO₂ Composite Thin Films and their Crystallization Behaviors

Authors: Tetsuya Otsuki, Tae Yanagihara, Yoshiaki Sakashita, Mitsunobu Sato, Toshikazu Nishide

539

Atomistic Simulation of the Surface Energy and Structure of the Clean and Hydrated Surfaces of Spinel MgAl₂O₄

Authors: Chang Ming Fang, S. C. Parker, G. de With

543

Pulsed Laser Deposition of Diamond Like Carbon (DLC) and Zirconia-Toughened Alumina (ZTA) on Steels and PMMA

Authors: Yibran Perera, G. Schlaghecken, J. Gottmann, E.W. Kreutz, R. Poprawe

547

Spraying Parameter Optimization and Ageing Behavior of Zirconia Stabilised by Magnesium Oxide

Authors: Ioanna Kyriopoulou, I. Palli, P. Asimidis

551

Influence of AlN Intergranular Phases on Wetting and Bonding between Copper and Aluminum Nitride

Authors: Thierry Joyeux, Jean Jarrige, J.C. Labbe, J.P. Lecompte

555

Remote Microwave Plasma Enhanced Chemical Vapor Deposition (RMPECVD) of Silica and Alumina Films

Authors: Jean Desmaison, H. Hidalgo, P. Tristant, F. Naudin, D. Merle

559

Interfacial Reactions between Titanium Nitride-Titanium Diboride Ceramics and Nickel

Authors: E. Fénard, Martine Desmaison-Brut, Thierry Joyeux

563

Chemical Vapour Infiltration on SiC in Porous Graphite Materials

Authors: Edward Walasek, Stanisława Jonas, T. Stapinski, S. Kluska, A. Czyżewska

567