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HomeKey Engineering MaterialsKey Engineering Materials Vols. 214-215Preparation and Characterization of C-Axis...

Preparation and Characterization of C-Axis Oriented Epitaxial Bi₂VO_5.5 Thin Films Prepared by Metalorganic Chemical Vapor Deposition

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Asian Ceramic Science for Electronics I

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Periodical:

Key Engineering Materials (Volumes 214-215)

Pages:

189-192

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.214-215.189

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Online since:

July 2001

Authors:

Katsuyuki Ishikawa, Tomohiro Sakai, Takayuki Watanabe, Hiroshi Funakubo

Keywords:

Bi(CH₃)₃, Bi₂VO_5.5, Chemical Vapor Deposition (CVD), Epitaxial Film, VO(O·C₂H₅)₃

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© 2002 Trans Tech Publications Ltd. All Rights Reserved

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