Fabrication and Evaluation of Ca,Sr-Doped-LaCrO3 Thin Film Electric Heaters

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Edited by:

T. Kimura, T. Takenaka, S. Fujitsu and K. Shinozaki

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121-124

Citation:

K. Wakisaka et al., "Fabrication and Evaluation of Ca,Sr-Doped-LaCrO3 Thin Film Electric Heaters", Key Engineering Materials, Vol. 248, pp. 121-124, 2003

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August 2003

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[1] S. Sofue, S. Yoshikado, Trans. IEE of Japan., 119-A (1999), p.636.

[2] S. Hayashi, S. Yoshikado, Key Engineering Materials., 216 (2002), p.105. e-mail: syoshika@mail. doshisha. ac. jp, fax: 0774-65-6801�.

[6] 0. 01.

[2] [4] [6] 0. 1.

[2] [4] [6] [1] [2] [4] Normalized Conductivity 1300 1200 1100 1000 Temperature of annealing / ͠ alumina Si(100) Fig. 7. XRD patterns of thin films after thermal annealing at 1400 � C for 2 hours. � Fig. 8. The heating state of the thin film heater at 900 � C fabricated using thin film deposited on an alumina substrate at 700 � C. Intensity / a. u.

[80] [60] [40] [20] 2θ / degree (110) (002) (420) (116) (224) (400) (132) (024) (312) (222) (220) (004)(202) (022) (112) (404) (044) Target (La0. 85Ca0. 15)CrO3 alumina substrate Si(100) substrate � � � : peak of Si(100) Fig. 6. The relationship between normalized conductivity and thermal annealing temperatures of (La0. 85Ca0. 15)CrO3 thin films annealed for 2 hours.

[10] mm.

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