Control of Crystallinity of Alkoxy-Derived Zirconia Thin Films by UV Irradiation

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T. Kimura, T. Takenaka, S. Fujitsu and K. Shinozaki

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125-128

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K. Nishizawa et al., "Control of Crystallinity of Alkoxy-Derived Zirconia Thin Films by UV Irradiation", Key Engineering Materials, Vol. 248, pp. 125-128, 2003

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August 2003

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[1] H. S. Choi, E. H. Kim, I. H. Choi, Y. T. Kim, J. H. Choi and J. Y. Lee, Thin Solid Films, 388, (2001), p.226.

[2] C. M. Perkins, B. B. Triplett, P. C. Mclntyre, K. C. Saraswat, S. Haukka and M. Tuominen, Appl. Phys. Lett., 78 [16], 2001, p.2357.

[3] G. L. Tan, X. J. Wu, Thin Solid Films, 330, 1998, p.59.

[4] K. Nishizawa, T. Miki, K. Suzuki, K. Kato, Key Engineering Materials, 228-229, 2002, pp.147-152.

[1] 0 2 0 3 0 4 0 5 0 6 0 7 0.

[2] t h e t a � � � d e g r e e I n t e n s i t y / a . u . ( d ) ( e ) ( f ).

[1] 0 n m.

[0] [5] 0 0 n m S i S i S i ( a ) ( b ) ( c ).

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[٨] [٨] g r a i n s i z e : c a . 2 0 n m R M S : 0 . 4 1 n m g r a i n s i z e : c a . 1 0 0 n m R M S : 1 . 3 9 n m g r a i n s i z e : c a . 3 0 n m R M S : 0 . 6 7 n m ( 1 0 1 ).

[5] 0 0 n m.

[5] 0 0 n m.

[0] [0] [1] 0 n m.

[1] 0 n m 0.

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