Effects of SiO2-Based Additives on Bi-Based Layer-Structured Ferroelectrics

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Periodical:

Edited by:

T. Kimura, T. Takenaka, S. Fujitsu and K. Shinozaki

Pages:

41-44

DOI:

10.4028/www.scientific.net/KEM.248.41

Citation:

K. Kato and H. Ishiwara, "Effects of SiO2-Based Additives on Bi-Based Layer-Structured Ferroelectrics", Key Engineering Materials, Vol. 248, pp. 41-44, 2003

Online since:

August 2003

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$35.00

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