Silicon Nitride Films Deposited by Low Pressure Chemical Vapor Deposition from SiH4-NH3-N2 System

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Periodical:

Key Engineering Materials (Volumes 264-268)

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Edited by:

Hasan Mandal and Lütfi Öveçoglu

Pages:

643-648

DOI:

10.4028/www.scientific.net/KEM.264-268.643

Citation:

X. J. Liu et al., "Silicon Nitride Films Deposited by Low Pressure Chemical Vapor Deposition from SiH4-NH3-N2 System ", Key Engineering Materials, Vols. 264-268, pp. 643-648, 2004

Online since:

May 2004

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$35.00

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