Silicon Nitride Films Deposited by Low Pressure Chemical Vapor Deposition from SiH4-NH3-N2 System

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Key Engineering Materials (Volumes 264-268)

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Edited by:

Hasan Mandal and Lütfi Öveçoglu

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643-648

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X. J. Liu et al., "Silicon Nitride Films Deposited by Low Pressure Chemical Vapor Deposition from SiH4-NH3-N2 System ", Key Engineering Materials, Vols. 264-268, pp. 643-648, 2004

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May 2004

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DOI: https://doi.org/10.1016/s0040-6090(98)01587-9