Nondestructive and Non-Contact Characterization Technique for Metal Thin Films Using a Near-Field Microwave Microprobe

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Abstract:

We observed the surface resistance of metal thin films by a nondestructive characterization method using a near-field scanning microwave microprobe (NSMM). The NSMM system was coupled to a dielectric resonator with a distance regulation system. To demonstrate the ability of local microwave characterization, the surface resistance dependence of the metallic thin films has been mapped nondestructively.

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Key Engineering Materials (Volumes 321-323)

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1457-1460

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October 2006

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© 2006 Trans Tech Publications Ltd. All Rights Reserved

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