Nondestructive and Non-Contact Characterization Technique for Metal Thin Films Using a Near-Field Microwave Microprobe

Abstract:

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We observed the surface resistance of metal thin films by a nondestructive characterization method using a near-field scanning microwave microprobe (NSMM). The NSMM system was coupled to a dielectric resonator with a distance regulation system. To demonstrate the ability of local microwave characterization, the surface resistance dependence of the metallic thin films has been mapped nondestructively.

Info:

Periodical:

Key Engineering Materials (Volumes 321-323)

Edited by:

Seung-Seok Lee, Joon Hyun Lee, Ik Keun Park, Sung-Jin Song, Man Yong Choi

Pages:

1457-1460

DOI:

10.4028/www.scientific.net/KEM.321-323.1457

Citation:

H. J. Yoo et al., "Nondestructive and Non-Contact Characterization Technique for Metal Thin Films Using a Near-Field Microwave Microprobe", Key Engineering Materials, Vols. 321-323, pp. 1457-1460, 2006

Online since:

October 2006

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Price:

$35.00

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