[1]
H.S. Nalwa, Handbook of Low and High Dielectric Constant Materials and Their Applications, Academic Press, USA, 1999.
Google Scholar
[2]
L. Davis Jr and L.G. Rubin, J. Appl. Phys., 24 (1953) 1194.
Google Scholar
[3]
D.S. Korn and H.D. Wu, Integr. Ferroelectr., 24 (1999) 215.
Google Scholar
[4]
O.G. Vendik and S.P. Zubko, J. Appl. Phys., 88 (2000) 5343.
Google Scholar
[5]
A.T. Findikoglu, R. Camassa, G. Lythe, Q.X. Jia, Appl. Phys. Lett., 80 (2002) 3391.
Google Scholar
[6]
X.F. Liang, W.B. Wu, and Z.Y. Meng, Mater. Sci. Eng. B, 99 (2003) 366.
Google Scholar
[7]
C. Huber, M. Treguer-Delapierre, C. Elissalde, F. Weill, and M. Maglione, J. Mater. Chem., 13 (2003) 650.
DOI: 10.1039/b300991b
Google Scholar
[8]
K.B. Chong, L.B. Kong, L.F. Chen, L. Yan, C.Y. Tan, T. Yang, C.K. Ong, and T. Osipowicz, J. Appl. Phys., 95 (2004) 1416.
Google Scholar
[9]
E. Ngo, P.C. Joshi, M.W. Cole, C.W. Hubbard, Appl. Phys. Lett., 79 (2001) 248.
Google Scholar
[10]
B. Su and T.W. Button, J Appl. Phys., 95 (2004) 1382.
Google Scholar
[11]
R. Babbitt, T. Koscica, W. Drach, and L. Didomenico, Integr. Ferroelectr., 8 (1995) 65.
Google Scholar
[12]
J.Q. Qi, L.T. Li, Y.L. Wang, and Z.L. Gui, J of Cryst. Growth, 260 (2004) 551.
Google Scholar
[13]
H.Y. Tian, J.Q. Qi, Y. Wang, J. Wang, H.L.W. Chan, and C.L. Choy, Nanotechnology, 16 (2005) 47.
Google Scholar
[14]
J.Q. Qi, H.Y. Tian, Y. Wang, G.K.H. Pang, L.T. Li, and H.L.W. Chan, J. Phys. Chem. B, 109 (2005) 14006.
Google Scholar
[15]
C. Shen, Q.F. Liu, Q. Liu, Mater. Lett., 58 (2004) 2302.
Google Scholar
[16]
H.Y. Tian, J.Q. Qi, Y. Wang, H.L.W. Chan, C.L. Choy, Progress in solid chemistry, 33 (2005) 207.
Google Scholar
[17]
X.X. Xi, H.C. Li, W.D. Si, A.A. Sirenko, I.A. Akimov, J.R. Fox, A.M. Clark, and J.H. Hao, J. Electroceram., 4 (2000) 393.
Google Scholar