Study on Ultra Precision Polishing of Single Crystal Diamond Substrates under Ultraviolet Irradiation

Satoru Anan; Mutsumi Touge; Akihisa Kubota; Junji Watanabe

doi:10.4028/www.scientific.net/KEM.407-408.355

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HomeKey Engineering MaterialsKey Engineering Materials Vols. 407-408Study on Ultra Precision Polishing of Single...

Study on Ultra Precision Polishing of Single Crystal Diamond Substrates under Ultraviolet Irradiation

Abstract:

The ultraviolet irradiation-assisted ultra precision polishing was performed on single crystal diamond substrates. This polishing method has been newly developed in our laboratory. The change of polishing performances was investigated by the presence of the UV irradiation. The polished surfaces were evaluated by the observation with WYKO. The experimental results are as follows; Surface roughness of diamond substrates polished under UV irradiation has become clearly smoother than that without UV irradiation. The surface roughness by this polishing method was reached to be 0.19 nm Ra on (100) surface of single crystal diamond. The equivalent surface was obtained on (110) surface by the UV-polishing.

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Periodical:

Key Engineering Materials (Volumes 407-408)

Pages:

355-358

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.407-408.355

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Online since:

February 2009

Authors:

Satoru Anan, Mutsumi Touge, Akihisa Kubota, Junji Watanabe

Keywords:

Single Crystal Diamond Substance, Ultra-Precision Polishing, Ultraviolet Irradiation

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References

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[1] 2 3 4 0. 5 1. 0 1. 5 2. 0 2. 5 3. 0.

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[2] [4] [6] [8] [10] [12] [0] Polishing time T hr Average roughness Ra nm Maximum roughness Rz nm Diamond (110) plane under UV-polishing Ra Rz Figure 4 The change in Ra and Rz of diamond (110) plane with increasing polishing time.

DOI: 10.17814/mechanik.2016.8-9.235

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