Microstructure and Leakage Current Characteristics of ZrTiO4 Thin Films by Sol-Gel Method
This paper describes microstructure and leakage current characteristics of ZrTiO4 thin films on ITO/Glass substrate were deposited by sol-gel method with a fix per-heating temperature of 250oC for 30min at various annealing temperatures from 600oC to 800oC for 1 hr. The annealed films were characterized using X-ray diffraction. The surface morphologies of annealed film were examined by atomic force microscopy. The dependence of the microstructure and leakage current characteristics on annealing temperature was also investigated.
Wei Pan and Jianghong Gong
C. H. Hsu et al., "Microstructure and Leakage Current Characteristics of ZrTiO4 Thin Films by Sol-Gel Method", Key Engineering Materials, Vols. 434-435, pp. 228-230, 2010