Magnetron Sputtering of NiCr/NiSi Thin-Film Thermocouple Sensor for Temperature Measurement when Machining Chemical Explosive Material

Abstract:

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Temperature plays a vital role in the machining industry today. A Nickel-Chrome versus Nickel-Silicon thin-film thermocouple system has been established for measuring instantaneous workpiece temperature in chemical explosive material machining. The NiCr/NiSi thin-film thermocouples have been deposited inside high speed steel cutters by magnetron sputtering. The typical deposition conditions are summarized. Static and dynamic calibrations of the NiCr/NiSi thin-film thermocouples are presented. The Seebeck coefficient of the TFTC is 40.4 μV/°C which is almost the same as that of NiCr/NiSi wire thermocouple. The response time is about 0.42ms. The testing results indicate that the developed NiCr/NiSi thin-film thermocouple sensors can respond fast enough to catch the very short temperature pulse and perform excellently when machining chemical explosive material in situ.

Info:

Periodical:

Key Engineering Materials (Volumes 467-469)

Edited by:

Dehuai Zeng

Pages:

134-139

DOI:

10.4028/www.scientific.net/KEM.467-469.134

Citation:

Q. Y. Zeng et al., "Magnetron Sputtering of NiCr/NiSi Thin-Film Thermocouple Sensor for Temperature Measurement when Machining Chemical Explosive Material", Key Engineering Materials, Vols. 467-469, pp. 134-139, 2011

Online since:

February 2011

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Price:

$35.00

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