Preparation of α-Al2O3/TiN Multilayer Coating on Ti(C,N)-Based Cermet by Laser CVD
α-Al2O3 and α-Al2O3/TiN multilayer films were prepared on Ti(C,N)-based cermet substrate by laser chemical vapor deposition.α-Al2O3 and NaCl-type TiN films were prepared at Tdep = 1148 K. α-Al2O3/TiN multilayer film showed dense structure of cross section, and its surface morphology consisted of aggregated spherical grains. The adhesion of α-Al2O3/TiN multilayer film prepared on Ti(C,N)-based cermet was higher as compared with α-Al2O3 film directly prepared on the cermet.
Takashi Goto, Yi-Bing Cheng and Takashi Akatsu
Y. You et al., "Preparation of α-Al2O3/TiN Multilayer Coating on Ti(C,N)-Based Cermet by Laser CVD", Key Engineering Materials, Vol. 484, pp. 188-191, 2011