Preparation of α-Al2O3/TiN Multilayer Coating on Ti(C,N)-Based Cermet by Laser CVD

Abstract:

Article Preview

α-Al2O3 and α-Al2O3/TiN multilayer films were prepared on Ti(C,N)-based cermet substrate by laser chemical vapor deposition.α-Al2O3 and NaCl-type TiN films were prepared at Tdep = 1148 K. α-Al2O3/TiN multilayer film showed dense structure of cross section, and its surface morphology consisted of aggregated spherical grains. The adhesion of α-Al2O3/TiN multilayer film prepared on Ti(C,N)-based cermet was higher as compared with α-Al2O3 film directly prepared on the cermet.

Info:

Periodical:

Edited by:

Takashi Goto, Yi-Bing Cheng and Takashi Akatsu

Pages:

188-191

DOI:

10.4028/www.scientific.net/KEM.484.188

Citation:

Y. You et al., "Preparation of α-Al2O3/TiN Multilayer Coating on Ti(C,N)-Based Cermet by Laser CVD", Key Engineering Materials, Vol. 484, pp. 188-191, 2011

Online since:

July 2011

Export:

Price:

$35.00

In order to see related information, you need to Login.

In order to see related information, you need to Login.