Fabrication of BaTiO3 Films on Si Substrate by Inkjet Printing

Ai Komatsu; Takuya Hoshina; Spela Kunej; Hiroaki Takeda; Takaaki Tsurumi

doi:10.4028/www.scientific.net/KEM.485.187

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TEM Observation on Ferroelectric Domain Structures of PbTiO₃ Epitaxial Films
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Dielectric Properties of Nanograined BaTiO₃ Ceramics Fabricated by Aerosol Deposition Method
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Fabrication of BaTiO₃ Films on Si Substrate by Inkjet Printing
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HomeKey Engineering MaterialsKey Engineering Materials Vol. 485Fabrication of BaTiO3 Films on Si Substrate by...

Fabrication of BaTiO₃ Films on Si Substrate by Inkjet Printing

Abstract:

BaTiO₃ films were fabricated on Si substrate using inkjet printing technique. To achieve low-temperature fabrication of BaTiO₃ films, Ba-Ti-alkoxide ink was prepared. The mixing ratio and sequence of raw materials were optimized for controlling the chemical stability and viscosity of alkoxide ink. The inkjet printing films on Si substrate were annealed at 700 °C, and it resulted in the formation of BaTiO₃. It was found that the film quality was improved by adding BaTiO₃ nanoparticles into the Ba-Ti-alkoxide ink.

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Periodical:

Key Engineering Materials (Volume 485)

Pages:

187-190

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.485.187

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Online since:

July 2011

Authors:

Ai Komatsu, Takuya Hoshina, Spela Kunej, Hiroaki Takeda, Takaaki Tsurumi

Keywords:

Alkoxide, Barium Titanate (BT), Inkjet Printing, Low Temperature Process

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