Magnetic Properties of Epitaxial NiFe₂O₄ Thin Films Prepared Using Dynamic Aurora PLD in a Magnetic Field

Abstract:

This study examined effects of applying a magnetic field (up to 2 kG) on the magnetic properties of epitaxial NiFe₂O₄ (NF) thin films during deposition. The NF films were deposited on Y_0.15Zr_0.85O1.93 (YSZ) buffered Si (001) substrates using pulsed laser deposition (PLD). Although application of magnetic field during deposition affected neither the crystal structure nor orientation of the NF thin films, it improved magnetic properties. The saturation magnetization (Ms) of NF thin films deposited at 500°C and 600°C without application of a magnetic field was as low as 40 emu/g. However, that of NF deposited under magnetic field of 2 kG got to bulk Ms (50.3 emu/g). The TEM observation results revealed that the anti-phase boundary (APB) density decreased by application of the magnetic field during deposition. Results show that magnetic properties of NF thin films are controllable using the magnetic field during deposition.

• Periodical: Key Engineering Materials (Volume 485)
• Pages: 221-224
• DOI: https://doi.org/10.4028/www.scientific.net/KEM.485.221
• Online since: July 2011
• Authors: Takayoshi Kubo, Naonori Sakamoto, Kazuo Shinozaki, Hisao Suzuki, Naoki Wakiya
• Keywords: Dynamic Aurora PLD, Epitaxial Growth, Ferrite Thin Film, NiFe₂O₄

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