Planarization of Zinc Oxide Surface and Evaluation of Processing Damage

Hiroki Miyazaki; Yutaka Adachi; Isao Sakaguchi; Takamasa Ishigaki; Naoki Ohashi

doi:10.4028/www.scientific.net/KEM.485.215

Paper Titles

Growth of Orientation-Controlled Epitaxial KNbO₃ Thin Film by Hydrothermal Method
p.199

Influence of Schottky Interfaces on Dielectric Properties in Perovskite-Type Oxide Thin-Film Capacitors
p.203

Low-Loss Transmission Characteristics of Transparent Conductive Thin Films in GHz Range
p.207

Fabrication and Evaluation of Al₂O₃ Films Using the Aerosol Deposition Method
p.211

Planarization of Zinc Oxide Surface and Evaluation of Processing Damage
p.215

Magnetic Properties of Epitaxial NiFe₂O₄ Thin Films Prepared Using Dynamic Aurora PLD in a Magnetic Field
p.221

Influence of Al₂O₃ Addition on the Temperature Dependence of Initial Permeability of NiCuZn Ferrites
p.225

Composite Electromagnetic Wave Absorber Made of Ni-Zn Ferrite Particles Dispersed and Isolated in an SiO₂ Medium
p.229

Relationship between the Crystallinity and Magnetic Properties of Cr₂O₃/LiNbO₃/Cr₂O₃ Multi-Layer Materials
p.233

HomeKey Engineering MaterialsKey Engineering Materials Vol. 485Planarization of Zinc Oxide Surface and Evaluation...

Planarization of Zinc Oxide Surface and Evaluation of Processing Damage

Abstract:

The processes for polishing a ZnO surface were investigated with the aim of establishing a process for obtaining an atomically flat surface with high crystalline quality. The defects in a layer undergoing mechanical polishing were monitored through photoluminescence measurements, and the purity of the polished surface was characterized by SIMS. An atomicallyfishing process.

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Key Engineering Materials (Volume 485)

Pages:

215-218

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.485.215

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Online since:

July 2011

Authors:

Hiroki Miyazaki, Yutaka Adachi, Isao Sakaguchi, Takamasa Ishigaki, Naoki Ohashi

Keywords:

Luminescence, Planarization, Polishing, Processing Damage, Single Crystal, Zinc Oxide (ZnO)

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