Fabrication and Evaluation of Al2O3 Films Using the Aerosol Deposition Method
Equipment was designed for the application of Al2O3 thin films by the aerosol deposition method (ADM) at room temperature. Al2O3 film could be deposited on Pyrex-glass, indium tin oxide (ITO), polyvinyl chloride (PVC) plastic, single crystal silicon, and sapphire substrates. The films had the same crystal structure as the raw material particles and were highly transparent. The breakdown electric field of the Al2O3 film for the ADM was more than 35 kV/mm.
Chazono Hirokazu, Fujihara Shinobu, Katayama Keiichi, Masumoto Hiroshi, Mizoguchi Teruyasu, Osada Minoru, Shinozaki Kazuo and Takeda Hiroaki
Y. Uemichi et al., "Fabrication and Evaluation of Al2O3 Films Using the Aerosol Deposition Method", Key Engineering Materials, Vol. 485, pp. 211-214, 2011