Effect of Atomic Oxygen Exposure on Polyhedral Oligomeric Silsesquioxane/Polyimide Hybrid Materials in Low Earth Orbit Environment

Abstract:

A novel polyimide (PI) hybrid nanocomposite containing polyhedral oligomeric silsesquioxane (POSS) had been prepared by copolymerization of octa(aminophenyl)silsesquioxane (OAP-POSS), 4,4’ -oxydianiline (ODA), and pyromellitic dianhydride (PMDA). The AO resistance of these POSS/PI hybrid films was tested in the ground-based AO simulation facility. Exposed and unexposed surfaces have been characterized by X-ray photoelectron spectroscopy and FTIR. The XPS data indicate that the carbon content of the near-surface region is decreased from 63.6 to 19.3 at% after AO exposure. The oxygen and silicon concentrations in the near-surface region increase after AO exposure. The data reveal the formation of a passive inorganic SiO₂ layer on the POSS/PI hybrid films during the AO exposure, which serves as a protective barrier preventing further degradation of the underlying polymer with increased exposure to the AO flux. SEM images showed that the surface of the 10 wt% POSS/PI became much less rough than that of the pristine polyimide. The AO resistance of the POSS/PI hybrid films is up to several tenfold than that of the pristine polyimide.

• Periodical: Key Engineering Materials (Volume 492)
• Pages: 521-524
• DOI: https://doi.org/10.4028/www.scientific.net/KEM.492.521
• Online since: September 2011
• Authors: Shu Wang Duo, Mi Mi Song, Ting Zhi Liu, Chang Yuan Hu, Mei Shuan Li
• Keywords: Atomic Oxygen, Hybrid Material, Polyimide, POSS

References

[1] M. R. Reddy, J. Mater. Sci. Vol. 30 (1995), p.281.

[2] H. Shimamura, T. Nakamura, Polym. Degrad. Stabil. Vol. 94 (2009), p.1389.

[3] L. Ghosh, H. Kinoshita, N. Ohmae, Comp. Sci. Technol. Vol. 67 (2007), p.1611.

[4] S. Duo, M. Li, J. Tong, G. Sun, J. Mater. Sci. Tech. Vol. 19 (2003), p.535.

[5] R.C. Tennyson. High Perform. Polym. Vol. 11 (1999), p.157.

[6] R. Cooper, H. P. Upadhyaya, T. K. Minton, et al. Thin Solid Films Vol. 516 (2008), p.4036.

[7] E. Miyazaki, M. Tagawa, K. Yokota, et al. Acta Astronautica Vol. 66 (2010), p.922.

[8] D.P. Dworak, B.A. Banks, C.A. Karniotis, et al. : J. Spacecr. Rockets Vol. 43 (2006). P. 393.

[9] J.W. Gilman, D.S. Schlitzer, J.D. Lichtenhan, J. Appl. Polym. Sci. Vol. 60 (1996), p.591.

[10] P.D. David, D.S. Mark, Prog. Org. Coat. Vol. 47 (2003), p.448.

[11] A.L. Brunsvold, T.K. Minton, I. Gouzman, et al. : High Perform. Polym. Vol. 16 (2004), p.303.

[12] M. Tagawa, K. Yokota, Acta Astronaut. Vol. 62 (2008), p.203.

[13] R. Verker, E. Grossman, N. Eliaz, Acta Materialia Vol. 57 (2009), p.1112.

[14] M. Nandi, J.A. Conklin, L. Salvati, A. Sen, Chem. Mater. Vol. 3 (1991), p.201.