Study of the early Stage of Deposition Process for Electrodeposited Ni_100-XFe_X Thin Films

Abstract:

The aim of this work is to understand the early stages in the growth mechanism of invar (Fe64Ni34) alloys and also to study the influence of potential on the evolution of their crystalline structures. Fe64Ni34 layers were deposited onto copper substrates under optimal conditions using the electrochemical method of cyclic voltammetry (CV) and chronoamperometry (CA). The influence of the potential is examined and the nucleation kinetics is discussed. In this purpose, the obtained experimental data was interpreted by applying useful theoretical methods developed by Scharifker and Hills. X-ray diffraction experiments were performed on all samples in order to follow the structural evolution of Fe64Ni34 layers as a function of the potential.

• Periodical: Key Engineering Materials (Volume 495)
• Pages: 1-4
• DOI: https://doi.org/10.4028/www.scientific.net/KEM.495.1
• Online since: November 2011
• Authors: Saci Messaadi, Mosbah Daamouche, Abderrahim Guittoum, Hadria Medouer, Noureddine Fenineche, Ibtissem Zidani
• Keywords: Crystal Growth, Electro-Deposition, Nickel-Iron Alloys, Nucleation Process, Structure

References

[1] S. D. Leith, W. Wang, D. T. Schwartz, J. Electrochem. Soc. 145 (1999) 2827 - 2833.

[2] Thomas Fearn, British Patent 2266 (1871).

[3] K. -M. Yin, B. -T. Lin, Surface and Coatings Technology 78 (1996) 205-210.

[4] Xiaochun Li, Zhixei Li, Proceedings of IMECE'03, 2003 ASME International Mechanical Engineering Congress, Washigton, D. C., November 15-21, (2003).

[5] Giouroudi, A. Ktena and E. Hristoforou, J. Opt. Adv. Mat., 6, (2004) 45.

[6] A. Brenner, « Electrodeposition of alloys », vol. 1, Academic Press, New York, (1963), 77.

[7] H. Chiriac, M. Pletea and E. Hristoforou, Sensors and Actuators A, 68, (1998) 414.

[8] E. Hristoforou, J. Opt. Adv. Mat., 4, (2002) 245.

[9] A. Milchev, Electrocristallisation. Fundamentals of nucleation and growth, kluwer Academic Publishers, Boston/ Dordrecht/London, (2002).

[10] B. Scharifker, G. Hills, Electrochem. Ata 28 (1983) 879.

[11] S. N. Srimathi, S. M. Mayanna, Met. Finish, 83, N°3, (1985), 45.

[12] H. Medouer, M. Daamouche, A. Guittoum, S. Messaadi, S. H. Karagianni, J. Opt. Adv. Mat., (will be submitted).

[13] Staikov, Electrocistallization in nanotechnology, WILEY-VCH Verlag Gmbh&Co. KGaA (2007).

DOI: 10.1002/9783527628155

[14] A. Afshar, A G Dolati, M. Ghorbani, Mat. Chem. Phys. 77 (2002) 352.

[15] Fabio R. Bento, Lucia H. Mascaro, Surf. Coat. Technol. 201 (2006) 1752.

[16] A. Azizi, A. Sahari, G. Schmerber and A. Dimia, International J. of Nanoscience, 7 (2008) 345.

[17] Ibro tabakovic, Venkateswara inturi, Jeremy Thurn, Mark Kief, Electrochem. Ata 55 (2010) 6749.

[18] Chang-wei Su, Feng-jiao He, Hui Ju, Yu-bin Zhang, Er-Li Wang, Electrochimica Acta 54 (2009) 6257.