Development of a High-Speed Nanoprofiler Using Normal Vector Tracing

Takao Kitayama; Daisuke Tonaru; Hiroki Matsumura; Junichi Uchikoshi; Yasuo Higashi; Katsuyosi Endo

doi:10.4028/www.scientific.net/KEM.516.606

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Development of a High-Speed Nanoprofiler Using Normal Vector Tracing
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HomeKey Engineering MaterialsKey Engineering Materials Vol. 516Development of a High-Speed Nanoprofiler Using...

Development of a High-Speed Nanoprofiler Using Normal Vector Tracing

Abstract:

A new high-speed nanoprofiler was developed in this study. This profiler measures normal vectors and their coordinates on the surface of a specimen. Each normal vector is determined by making the incident light path and the reflected light path coincident using five-axis simultaneously controlled stages. From the acquired normal vectors and their coordinates, the three-dimensional shape is calculated by a reconstruction algorithm. In this study, a concave spherical mirror with a 400 mm radius of curvature was measured. As a result, a peak of 30 nm PV was observed at the centre of the mirror. Measurement repeatability was 1 nm. In addition, cross-comparison with a Fizeau interferometer was implemented and the results were consistent within 10 nm. In particular, the high spatial frequency profile was highly consistent, and any differences were considered to be caused by systematic errors.

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Proceedings of Precision Engineering and Nanotechnology

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Periodical:

Key Engineering Materials (Volume 516)

Pages:

606-611

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.516.606

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Online since:

June 2012

Authors:

Takao Kitayama, Daisuke Tonaru, Hiroki Matsumura, Junichi Uchikoshi, Yasuo Higashi, Katsuyosi Endo

Keywords:

Aspheric Mirror, Direct Measurement, Five-Axis Simultaneous Control, Normal Vector, Profiler, Slope Error, Ultra Precision Mirror, Ultra-Precision Machining

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References

[1] Y. Higashi, Y. Takaie, K. Endo, T. Kume, K. Enami, K. Yamauchi, K. Yamamura, Y. Sano, K. Ueno, Y. Mori, Proc. of SPIE Vol. 6317 6317B-1, 14-16 August 2006, San Diego, California, USA.

DOI: 10.1117/12.617986

Google Scholar

[2] Y. Higashi, Y. Takaie, K. Endo, T. Kume, K. Enami, K. Yamauchi, K. Yamamura, Y. Sano, K. Ueno, Y. Mori, Proc. of SPIE Vol. 6317 6317B-1, 14-16 August 2006, San Diego, California, USA.

DOI: 10.1117/12.617986

Google Scholar

[3] Y. Higashi, Y. Takaie, K. Endo, T. Kume, K. Enami, K. Yamauchi, K. Yamamura, Y. Sano, K. Ueno, Y. Mori, Proc. SPIE, Optics & Photonics, Advancesin Metrology for X-Ray and EUV Optics, Proc. of SPIE Vol. 6704 6704D-1, 30 August 2007, San Diego, California, USA.

DOI: 10.1117/12.617986

Google Scholar

[4] Y. Higashi; T. Ueno; K. Endo, J. Uchikoshi, T. Kume, K. Enami, Proc. SPIE Optics + Photonics 2008 Advances in X-Ray/EUV Optics and Components III Proceedings of SPIE Vol. 7077, 11-13 August 2008, San Diego, California, USA.

DOI: 10.1117/12.680245

Google Scholar