Quadruple Stacked Elliptical Supermirror Device for One Dimensional Neutron Focusing

Mikinori Nagano; Fumiya Yamaga; Dai Yamazaki; Ryuji Maruyama; Kauhiko Soyama; Kazuya Yamamura

doi:10.4028/www.scientific.net/KEM.523-524.272

Paper Titles

A Study on Driven-Type Rotary Cutting for Finish Turning of Carburized Hardened Steel
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Development of a New Ultra-Precision Magnetic Abrasive Finishing Process
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Adhesion Strength of Electroless Copper Plated Layer on Fluoropolymer Surface Modified by Medium Pressure Plasma
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Material Removal Rate Control in Open-Air Type Plasma Chemical Vaporization Machining Using Optical Actinometry
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Quadruple Stacked Elliptical Supermirror Device for One Dimensional Neutron Focusing
p.272

A Simulation Study on Figure Error Correction Using Near-Gaussian Removal Function in Numerical Controlled Local Wet Etching
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Analysis of Discharge Current in Wire-EDM Considering Electromagnetic Fields in and between Electrodes
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Challenge to Development of Functional Multi-Wire EDM Slicing Method Using Wire Electrode with Track-Shaped Section
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Development of Deburring Technology with Whirling EDM - Influence of the Motor Rotational Speed Control Conditions and the Electrical Conditions on the Machining Characteristics
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HomeKey Engineering MaterialsKey Engineering Materials Vols. 523-524Quadruple Stacked Elliptical Supermirror Device...

Quadruple Stacked Elliptical Supermirror Device for One Dimensional Neutron Focusing

Abstract:

Focusing neutron beam with wide wavelength range is an indispensable technique used to compensate for weak signals from tiny samples in various experiments using pulsed neutron beam generated from high intensity proton accelerator facilities, such as J-PARC. Aspherical supermirror device is one of the most effective optical devices for focusing neutron beam with wide wavelength range since it has no chromatic aberration. Stack of aspherical supermirror enables us to focus neutron beams with wide divergence. Thin mirrors with a millimeter thickness are required to minimize the absorption loss of incident neutron beams since the thickness of a mirror shadows the reflective area of the other mirrors. Previously, we developed a fabrication process of a precise millimeter-thick elliptical supermirror. This process consists of noncontact figuring by the numerically controlled local wet etching technique, the finishing of surface without degrading mirror shape by low-pressure polishing, and the ion beam sputter deposition of NiC/Ti multilayers on both sides of the mirror substrate to compensate for film stress. In this paper, we report fabrication of elliptical supermirror with a thickness of 1 mm and development of multiply-arranged neutron focusing mirror device using stacked 4 fabricated elliptical supermirror with a thickness of 1mm.