Fabrication of Si Mold Using ICP Etching for X-Ray Diffraction Grating

Daiji Noda; Atsushi Tokuoka; Tadashi Hattori

doi:10.4028/www.scientific.net/KEM.523-524.587

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Fabrication of Si Mold Using ICP Etching for X-Ray Diffraction Grating
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Fabrication of Si Mold Using ICP Etching for X-Ray Diffraction Grating

Abstract:

We have fabricated X-ray diffraction gratings for X-ray phase imaging using X-ray Talbot interferometer. In this paper, we propose the new low cost fabrication process using Si mold of Si dry etching and nano-imprint techniques. Si dry etching makes it possible to fabricate high aspect ratio rectangular microstructures. Therefore, this technique is expected to fabricate high precision grating pattern. In this paper, we propose the new low cost fabrication processes using Si mold of ICP-RIE and nano-imprint techniques. And, in order to form transparence imprint mold, we used thermal oxidation of Si mold. These demonstrations of thermal oxidation are promising method for high precision transparence imprint mold with low cost, and realized low cost optical device such as diffraction gratings.