Effect of Precursor Concentration on the Ideal ZrO2 Sols and Thin Films

Sheng Zhao Wang; Li Na Zhang; Chun Juan Nan; Da Yong Huang

doi:10.4028/www.scientific.net/KEM.538.69

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HomeKey Engineering MaterialsKey Engineering Materials Vol. 538Effect of Precursor Concentration on the Ideal...

Effect of Precursor Concentration on the Ideal ZrO₂ Sols and Thin Films

Abstract:

ZrO₂ sols were prepared with hydrothermal synthesis method. The ZrO₂films were characterized or examined by many kinds of instruments. With different content of zirconium oxychloride octahydrate, the particle sizes of ZrO₂ sols are different from 3nm to 25nm. And 1-on-1 laser-induced damage threshold tests on ZrO₂films were carried out with a Q–switched Nd-YAG high power laser at 1064 nm. The experimental results showed that the ZrO₂ sols is suitable for preparing ZrO₂thin film and the refractive index and thickness of this thin films achieve our requirement.

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Periodical:

Key Engineering Materials (Volume 538)

Pages:

69-72

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.538.69

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Online since:

January 2013

Authors:

Sheng Zhao Wang, Li Na Zhang, Chun Juan Nan, Da Yong Huang

Keywords:

High Laser-Induced Damage Threshold, Highly Reflective Coatings, Sol-Gel (SG)

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