Research on Chemical Mechanical Polishing Technology of SiC Mirror

Zhen Fang Ma; Lian He Dong; Yan Jun Sun; Yan Bing Leng; Zhe Chen

doi:10.4028/www.scientific.net/KEM.552.168

Paper Titles

Study and Fabrication of Multi-Band Filter Film on ZnS Substrate
p.147

Research on Preparation Band-Pass Filter by Lon Beam Sputtering
p.152

Symmetric Distortion Correction in Asphere Manufacturing
p.158

Study of Optical and Electrical Properties of Ag/ITO Multi-Layer Transparent Electrodes
p.162

Research on Chemical Mechanical Polishing Technology of SiC Mirror
p.168

Study on the Fabrication of RPAS Micro-Lens Array for CCD Integration
p.174

Reverse Design of the Roof Diamond Tool for Ruling Echelle Grating
p.180

The Research on Preparation Process Optimization of Ion Barrier Film on the Input Side of MCP
p.186

Monte Carlo Simulation of Electron Scattering in Ion Barrier Film in Generation III Image Intensifier
p.193

HomeKey Engineering MaterialsKey Engineering Materials Vol. 552Research on Chemical Mechanical Polishing...

Research on Chemical Mechanical Polishing Technology of SiC Mirror

Abstract:

This paper makes an researches on high precision polishing process of SiC mirror by using mechanical and chemical polishing combined methods. The chemical compositions, mechanical characteristics of SiC and the factors which affect the polishing precision and quality are analyzed. Also, the components of polishing liquid, polishing pad and the pressure of the millstone are also optimized. Then the author polishes a 220mm diameter SiC mirror which the roughness is less than 1 nm. The results show that the combination of chemical and mechanical polishing can overcome the traditional shortcomings of mechanical polishing and chemical etching method, improve the removal rate, further improve the polishing surface roughness, get the small surface damage layer and high integrity of smooth surfaces.

You might also be interested in these eBooks

View Preview

Info:

Periodical:

Key Engineering Materials (Volume 552)

Pages:

168-173

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.552.168

Citation:

Cite this paper

Online since:

May 2013

Authors:

Zhen Fang Ma, Lian He Dong, Yan Jun Sun, Yan Bing Leng, Zhe Chen

Keywords:

Chemical Mechanical Polishing, Roughness, SiC Mirror, Surface Quality

Export:

RIS, BibTeX

Price:

Permissions CCC:

Request Permissions

Permissions PLS:

Request Permissions

Сopyright:

Citation:

References

[1] David G Michel, "Silicon carbide mirror cryogenic distortion testing"; SPIE Vo1.2227, 7-14.

Google Scholar

[2] Mark A. Ealey, John A. Wellman, "Ultralight weight silicon carbide mirror design", SPIE Vo1.2857, 73 -77.

Google Scholar

[3] Pickering M.A., Taylor R.L., Keeley J.T., Graves CzA., "Chemically vapor deposited silicon carbide (SiC) for optical application", In: SPIE, Symposium on space optical materials and space qualification of optics, 1989, Orlando, Florida, USA, 50-54.

DOI: 10.1117/12.960942

Google Scholar

[4] Eric Hansen, John Roberts, "Design and modeling of 1-m silicon carbide f/16 secondary mirror for the Gemini telescopes", SPIE Vo1.2199, 835-840.

Google Scholar

[5] GT. Petrovsky, M. N. Tolstoy, S.V Lyubarsky, Y P. Khimich, "A 2.7-meter-diameter silicon carbide primary mirror for the SOFIA telescope", SPIE Vo1.2199, 263 -270.

DOI: 10.1117/12.176195

Google Scholar

[6] Yang Bingxin, "The space camera with silicon carbide ( SiC ) mirror research ", the National University of Defense Technology academic report.

Google Scholar