Nitrogen Content Influence on Optical Properties of DC Magnetron Sputtered Copper Nitride Films

Abstract:

In this paper, influence of nitrogen content on growth mode, surface morphology and the optical properties of copper nitride (Cu_xN) films was investigated. Cu_xN films were prepared on glass substrates by direct current (DC) magnetron sputtering at various nitrogen contents. X-ray diffraction (XRD), profilometer, atomic force microscope (AFM) and spectrophotometer were used to analyze the characteristics. The XRD measurements showed the films were composed of Cu and Cu₄N crystallites at working pressure with a low nitrogen content, while the structure of the films were conformed to anti-ReO₃ structure at a high nitrogen content and the preferred growth orientations of the Cu₃N films changed from (111) to (100). The transmittances of Cu_xN films increased with the increase of nitrogen content (r) in working gas flow from 0 to 0.6, while decreased when r increased from 0.6 to 0.9. Additionally, the lowest reflectivity and the maximum band gap of 1.35 eV for Cu_xN film were obtained at r = 0.6. The Cu_xN films deposited at various nitrogen contents have large differences on optical properties which provide a potential application in optical storage devices.

• Periodical: Key Engineering Materials (Volumes 562-565)
• Pages: 1001-1007
• DOI: https://doi.org/10.4028/www.scientific.net/KEM.562-565.1001
• Online since: July 2013
• Authors: Shu Yong Wang, Ning Yi Yuan, Jian Ning Ding
• Keywords: Copper Nitride, Magnetron Sputtering, Optical Property

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