Evaluation of TiO₂ Films Fabricated by Aerosol Deposition

Abstract:

Films of titanium dioxide (TiO₂) were deposited by aerosol deposition at room temperature. Anatase TiO₂ powders were used. The crystal structure of these films was a mixture of the anatase and brookite TiO₂ phases, while the rutile TiO₂ phase was observed at high carrier gas flow rates. The TiO₂ film thickness increased in proportion with the scan time and the carrier gas flow rate. Film thickness was constant at constant total deposition times. Flake-like and mesh-like surface morphologies were observed on the films. The direct-current resistivity was estimated from the dielectric constant and the loss tangent; it was found to be much smaller than that of bulk TiO₂. We speculate that this low resistivity is due to reduction of TiO₂ particles during room-temperature impact consolidation in a N₂ atmosphere.

• Periodical: Key Engineering Materials (Volume 566)
• Pages: 195-198
• DOI: https://doi.org/10.4028/www.scientific.net/KEM.566.195
• Online since: July 2013
• Authors: Kazuo Yuuki, Yuta Uemichi, Yuuki Sato, Shinzo Yoshikado
• Keywords: Aerosol Deposition, Anatase, Brookite, Room-Temperature Impact Consolidation, Rutile, Thin Film, Titanium Dioxide (TiO₂)

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