Study on the Influence of N-Doping to the In Situ Growth TiO₂ Film Photocatalytic Character

Abstract:

Thin TiO2 films in-situ growth on titanium alloy substrate were prepared in 0.05 mol/L H2SO4 electrolyte using the micro plasma oxidation method. The photocatalytic properties of the prepared thin TiO2 films were invested using Rhodamine B solution as a target pollutant. In order to improve the photocatalytic properties of the obtained TiO2 films, different content NH3·H2O was added into the H2SO4 electrolyte and obtained the N-doped TiO2 films photocatalyst. The influence of the doping ions on the crystal phase composition and microstructure of the TiO2 films were investigated by scanning electron microscopy (SEM) and X ray photoelectron spectroscopy (XPS). The results show that TiO2 films have uniformly grown closely on the surface of titanium substrate with pore size of 100-200 μm. The degradation efficiency of the TiO2 thin film prepared in H2SO4 + NH3·H2O is higher than that prepared with H2SO4, the degradation efficiency can reach 99% after 75 min, which increase about 10% than that of the H2SO4 eletrolyte.

• Periodical: Key Engineering Materials (Volumes 609-610)
• Pages: 147-151
• DOI: https://doi.org/10.4028/www.scientific.net/KEM.609-610.147
• Online since: April 2014
• Authors: Zhong Chen Yu*, Song Wang, Xin Wang, Yuan Lin Niu, Zhuan Li
• Keywords: In Situ Growth, Micro Plasma Method, N-Doping, Photocatalytic, TiO₂ Thin Film

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