[1]
F. Zhuge, W. Dai, C. L. He, A. Y. Wang, Y. W. Liu, M. Li, Y. H. Wu, P. Cui, Run-Wei Li, Nonvolatile resistive switching memory based on amorphous carbon, Appl Phys Lett. 96(2010) 163505-3.
DOI: 10.1063/1.3406121
Google Scholar
[2]
L F Liu, Y S Chen, J F Kang, Y Wang, D D Han, X Y Liu, X Zhang, Unipolar resistive switching and mechanism in Gd-doped-TiO2-based resistive switching memory devices, Semicond. Sci. Technol. 26 (2011)115009-6.
DOI: 10.1088/0268-1242/26/11/115009
Google Scholar
[3]
Xun Cao, Xiaomin Li, Xiangdong Gao, Weidong Yu, Xinjun Liu, Yiwen Zhang, Lidong Chen, Xinhong Cheng, Forming-free colossal resistive switching effect in rare-earth-oxide Gd2O3 films for memristor applications, J APPL PHYS. 106(2009) 073723-5.
DOI: 10.1063/1.3236573
Google Scholar
[4]
Wu X, Zhou P, Li J, et a1. Reproducible unipolar resistance switching in stoichiometric ZrO2 films, Appl Phys Lett. 90 (2007) 183507-3.
DOI: 10.1063/1.2734900
Google Scholar
[5]
Lin C Y, Wu C Y, Lee T C, et a1, Effect of top electrode material on resistive switching properties of ZrO2 film memory devices, IEEE Electron Device Lett. 28(2007) 366-368.
DOI: 10.1109/led.2007.894652
Google Scholar
[6]
D. Ielmini, Reliability issues and modeling of flash and post-flash memory, Microelectron. Eng. 86(2009) 1870-1875.
DOI: 10.1016/j.mee.2009.03.054
Google Scholar
[7]
G. Dearnaley, A.M. Stoneham, D.V. Morgan, Electrical phenomena in amorphous oxide films. Rep. Prog. Phys. 33(1970) 1129-1191.
DOI: 10.1088/0034-4885/33/3/306
Google Scholar
[8]
M. Villafuerte, S.P. Heluani, G. Juárez et al. Electric-pulse-induced reversible resistance in doped zinc oxide thin films, Appl. Phys. Lett. 90(2007) 052105-3.
DOI: 10.1063/1.2437688
Google Scholar
[9]
Kim D C, Seo S, Ahn S E, et a1, E1ectrical observations of filamentary conductions for the resistive memory switching in NiO films, Appl Phys Lett. 88(2006) 202102.
DOI: 10.1063/1.2204649
Google Scholar
[10]
Sim H, Choi D, Lee D, et al, Resistance-switching characteristics of polycrystalline Nb2O5 for nonvolatile memory application, IEEE Elec Dev Lett. 26(2005) 292-294.
DOI: 10.1109/led.2005.846592
Google Scholar
[11]
Lee D, ChoiI H, Sim H, et al, Resistance switching of the nonstoichiometric zirconium oxide for nonvolatile memory applications, IEEE Elec Dev Lett. 26(2005) 719-721.
DOI: 10.1109/led.2005.854397
Google Scholar
[12]
Courtade L., Turquat C, Muller C, et al, Oxidation kinetics of Ni metallic films Formation of NiO-based resistive switching structures, Thin Soild Films. 516(2008)4083-4092.
DOI: 10.1016/j.tsf.2007.09.050
Google Scholar
[13]
Hongxia Li, Ben Niu, Qinan Mao, Junhua Xi, Weiqing Ke, Zhenguo Ji, Resistive switching characteristics of ZnO based ReRAMs with different annealing temperatures, Solid State Electron. 75(2012) 28-32.
DOI: 10.1016/j.sse.2012.04.032
Google Scholar
[14]
Qinan Mao, Zhenguo Ji, Junhua Xi, Realization of forming-free ZnO-based resistive switching memory by controlling film thickness, J. Phys. D: Appl. Phys. 43 (2010) 395104-5.
DOI: 10.1088/0022-3727/43/39/395104
Google Scholar