Simulation of Nanoimprint Based on PSQ-L Polymer

Xin Guo; Ming Zhu Sun; Ming Shan Zhao; Xin Zhao

doi:10.4028/www.scientific.net/KEM.609-610.1498

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HomeKey Engineering MaterialsKey Engineering Materials Vols. 609-610Simulation of Nanoimprint Based on PSQ-L Polymer

Simulation of Nanoimprint Based on PSQ-L Polymer

Abstract:

A method of simulating nanoimprint process dynamically is proposed and a software program has been made to complete the simulation process automatically. Finite element method (FEM) is used to reveal mechanism of how the liquid flow in the imprint process by every static state. By means of static model iteration,we make a software to simulate the flow process dynamically and it can be used to forecast the result of the nanoimprint. The simulation system is used to predict residual layer thickness in the waveguide fabrication process.

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Periodical:

Key Engineering Materials (Volumes 609-610)

Pages:

1498-1502

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.609-610.1498

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Online since:

April 2014

Authors:

Xin Guo, Ming Zhu Sun, Ming Shan Zhao, Xin Zhao

Keywords:

Finite Element Method (FEM), Nanoimprint, PSQ-L Polymer, Static Model Iteration

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References

[1] Teng, Jie, et al. A PSQ-L polymer microring resonator fabricated by a simple UV-based soft-lithography process., Photonics Technology Letters, IEEE 21. 18 (2009): 1323-1325.

DOI: 10.1109/lpt.2009.2026551

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[2] Information on http: /www. wikipedia. org.

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