A Traceable Metrological Method with Nanometer Scale Resolution for Micro-Structure

Bo Hua Yin; Dai Xie Chen; Hong Xue; Yun Sheng Lin; Si Tian Gao; Wei Li; Li Han

doi:10.4028/www.scientific.net/KEM.645-646.810

Paper Titles

Study on Magnetization and Detection the Metal Particle in Harmonic Magnetic Field
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The Buckling Simulation of Planar W-Form Micro-Spring in MEMS Safety and Arming Device
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Design‚ Optimization and Simulation of an Electric Field Microsensor Based on PZT Piezoelectric Interdigitated Cantilevers
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Design and Application of Digitally-Programmable Delay-Time Microchip in Detonating System
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A Traceable Metrological Method with Nanometer Scale Resolution for Micro-Structure
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Accurate and Traceable Calibration of the Stiffness of Various AFM Cantilevers
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Design of Minimal Capacitance Detect Circuit for MEMS Capacitive Sensor
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Micro-Spring’s Variable Stiffness Design and Characteristics Analysis
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Fabrication Process and Electro-Thermal Modeling for the Cathode of the CMOS-Compatible Hot-Filament Vacuum Gauge
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HomeKey Engineering MaterialsKey Engineering Materials Vols. 645-646A Traceable Metrological Method with Nanometer...

A Traceable Metrological Method with Nanometer Scale Resolution for Micro-Structure

Abstract:

Micro-structure dimension metrology is a grand challenge to current metrological methods and tools. In this paper, a retraceable metrological scanning electron microscopy (M-SEM) system with precision stage and laser interferometer is presented in detail. The double stages structure is used to realize both sample positioning in 50mm×50mm range and accuracy imaging in several tens of micron scale. In order to acquiring metrological scanning image, the control system based on digital signal processing (DSP) is constructed. Furthermore, this paper focuses on demonstrating a metrological SEM image edge detection algorithm which is the essential part of the metrological SEM system to realize the traceable metrology of line width.

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Periodical:

Key Engineering Materials (Volumes 645-646)

Pages:

810-816

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.645-646.810

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Online since:

May 2015

Authors:

Bo Hua Yin, Dai Xie Chen, Hong Xue, Yun Sheng Lin, Si Tian Gao, Wei Li, Li Han*

Keywords:

Flexure Stage, Image Edge Detection, Laser Interferometer, Line Width Measurement, Scanning Electron Microscope

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* - Corresponding Author

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