Fabrication Process and Electro-Thermal Modeling for the Cathode of the CMOS-Compatible Hot-Filament Vacuum Gauge

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Abstract:

The hot-filament vacuum gauge is a traditional gauge for the vacuum measurement below 10-1Pa. It consists of the cathode, grid and anode. The cathode is used to emit the electron to collide with a gaseous molecular to form a pair of ion and electron. The number of these ions is proportional to the gaseous molecule density and the gas pressure. Unlike the traditional gauge with the large dimension, this paper develops a CMOS-compatible hot-filament vacuum gauge. With it, the vacuum gauge and its control circuit can be fabricated monolithically on a chip which will decrease the noise and be easy to use. Besides that, the optimal heating current for the cathode is also considered in this paper. The electro-thermal modeling using COMSOL software is introduced to calculate the heating current for cathode. The results show that for 200μm×5μm×0.2μm tungsten resistor, 200mA current is needed to heat the tungsten resistor to 1800°C to emit the electron.

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Key Engineering Materials (Volumes 645-646)

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836-840

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May 2015

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© 2015 Trans Tech Publications Ltd. All Rights Reserved

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[1] Jiaqi Wang, Zhenan Tang, and Jinfeng Li. Tungsten-Microhotplate-Array-Based Pirani Vacuum Sensor System with On-Chip Digital Front-End Processor. IEEE/ASME Journal of Microelectromechanical Systems, 20(4) (2011) 834-841.

DOI: 10.1109/jmems.2011.2148157

Google Scholar

[2] P.J. Abbott, J.P. Looney, P. Mohan. The effect of ambient temperature on the sensitivity of hot-cathode ionization gauges, Vacuum, 77 (2005) 217–222.

DOI: 10.1016/j.vacuum.2004.09.013

Google Scholar

[3] Kirt R. Williams and Richard S. Muller. Micromachined Hot-Filament Ionization Pressure Sensor and Magnetometer. 1997 lnternational Conference on Solid-state Sensors and Actuators (Transducers 97'), Chicago, 1997: 1249-1252.

DOI: 10.1109/sensor.1997.635461

Google Scholar

[4] John Liebeskind. Micro High-Vacuum Pressure Sensor. US patent 0186017A1(2002).

Google Scholar

[5] Lin Xiao, Liang Liu, Kai-Li Jiang, Shou-Shan Fan. Ionization vacuum gauge. US patent 0278436A1(2009).

Google Scholar

[6] Changkun Dong and Ganapati R. Myneni. Carbon nanotube electron source based ionization vacuum gauge, Applied physics letter, 84(26) (2004) 5443-5445.

DOI: 10.1063/1.1767956

Google Scholar

[7] Kirt R. Williams. Micromachined hot-filament vacuum devices, PhD dissertation, UC Berkeley, (1997).

Google Scholar

[8] Wang Jiaqi and Tang Zhenan. Tungsten for CMOS-MEMS Pirani and Ionization Vacuum Gauges, Nanotech 2013, 2(2013), 146-149.

Google Scholar

[9] M. Quirk, and J. Serda, Semiconductor Manufacturing Technology. Englewood Cliffs, Prentice Hall, New Jersey, (2001).

Google Scholar