Acid Surface Treatment of Sol-Gel Derived ZnO Thin Films for Anti-Reflection Coating Application

Warut Khamon; Wisanu Pecharapa

doi:10.4028/www.scientific.net/KEM.675-676.177

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HomeKey Engineering MaterialsKey Engineering Materials Vols. 675-676Acid Surface Treatment of Sol-Gel Derived ZnO Thin...

Acid Surface Treatment of Sol-Gel Derived ZnO Thin Films for Anti-Reflection Coating Application

Abstract:

Transparent ZnO films were deposited by sol-gel spin coating process. HCl acid was used in the wet etching process to modify its surface morphology that can be used as an anti-reflective layer of optoelectric devices. The effect of etching time on its structure, surface morphologies and optical properties were scrutinized. The overall results indicated that HCl acid has obviously effect on significant change in surface morphologies and its roughness varied in the range of 0.5 nm to 4.9 nm.

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Periodical:

Key Engineering Materials (Volumes 675-676)

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177-180

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.675-676.177

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Online since:

January 2016

Authors:

Warut Khamon, Wisanu Pecharapa*

Keywords:

HCl, Surface Morphology, Wet Etching, ZNO

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* - Corresponding Author

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