[1]
S. Kobayashi, J. J. Santillan, T. Itani, Quantitative analysis of EUV resist outgassing, Proc. of SPIE. 6923 (2008) 1-9.
DOI: 10.1117/12.771828
Google Scholar
[2]
E. M. Theodore, S. F. Nadir, V. Y. Boris, et al., Surface phenomena related to mirror degradation in extreme ultraviolet (EUV) lithography, Appl. Surf. Sci. 253 (2006) 1691-1708.
DOI: 10.1016/j.apsusc.2006.04.065
Google Scholar
[3]
B. M. Mertens, B. van der Zwan, P. W. H. de Jager, et al., Mitigation of surface contamination from resist outgassing in EUV lithography, Microelectr. Eng. 53 (2000) 659-662.
DOI: 10.1016/s0167-9317(00)00399-3
Google Scholar
[4]
Y. Luo, X. Wu, K. Wang, et al., Comparative study on the outgassing rate of materials using different methods, MAPAN-J. Metrol. Soc. India. 31 (2015) 61-68.
DOI: 10.1007/s12647-015-0160-2
Google Scholar
[5]
N. H. Yang, D. Ba, X. D. Wang, et al., Harmful gas exhausting and clean vacuum acquiring, Vacuum. 41 (2004) 15-20. In Chinese.
Google Scholar
[6]
Y. Z. Hu, Technique of clean ultra-high vacuum, Vacuum. 2 (1975) 1-39. In Chinese.
Google Scholar
[7]
Z. J. Chen, Common contaminations in vacuum devices and their cleaning ways, Equipment for Electronic Products Manufacturing (Research and Application of new Technique). 137 (2006) 61-64.
Google Scholar
[8]
D. Da, The design manual of vacuum, third ed., National defence industry press, Beijing, (2004).
Google Scholar
[9]
Y. Tan, Cleaning treatment in vacuum technology, Vacuum. Cryogenics. 11 (1992) 169-173.
Google Scholar
[10]
S. L. Ma, Y. L. Gong, X. H. Wen, A method of improvement of the ultimate vacuum in a stainless steel ultrahigh vacuum system, Vacuum. Cryogenics. 2 (1996) 78-80.
Google Scholar
[11]
C. G. Yang, Research on the thermal properties at low temperatures and outgassing under vacuum condition of environmental friendly polyurethane foams (D), Shanghai Jiao Tong University, Shanghai, 2007, p.110.
Google Scholar
[12]
X. M. Sheng, X. B. Wu, Y. Feng, et al., Experiment study of vacuum material outgassing rates, Appl. Mech. Mater. 303 (2013) 367-371.
Google Scholar
[13]
Y. J. Cheng, D. T. Li, D. X. Zhang, et al., Composition analysis of residual gases in extremely high vacuum calibration chamber, Chinese J. Vacuum. Sci. Tech. 30 (2010) 54-59.
Google Scholar