Obtaining and Maintaining of Clean High Vacuum on the Material Outgassing Test System

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A system was developed to test the outgassing of materials intended to use in Extreme Ultraviolet Lithography (EUVL). Clean high vacuum was achieved on the background by proper cleaning, processing and assembling, as well as by combining the magnetic levitated molecular pump with the dry mechanical pump. Much more care should be taken to operate this system to avoid introducing any contamination. Once the vacuum chamber is polluted by high-risk items like water (H2O) and hydrocarbons (CxHy), it should not be applied again. It is recognized experimentally that clean vacuum could be recovered by flushing with dry gases, baking and degassing, and baking is undoubtedly a more effective technique in efforts of controlling the pollution.

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111-118

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December 2016

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© 2017 Trans Tech Publications Ltd. All Rights Reserved

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[1] S. Kobayashi, J. J. Santillan, T. Itani, Quantitative analysis of EUV resist outgassing, Proc. of SPIE. 6923 (2008) 1-9.

DOI: 10.1117/12.771828

Google Scholar

[2] E. M. Theodore, S. F. Nadir, V. Y. Boris, et al., Surface phenomena related to mirror degradation in extreme ultraviolet (EUV) lithography, Appl. Surf. Sci. 253 (2006) 1691-1708.

DOI: 10.1016/j.apsusc.2006.04.065

Google Scholar

[3] B. M. Mertens, B. van der Zwan, P. W. H. de Jager, et al., Mitigation of surface contamination from resist outgassing in EUV lithography, Microelectr. Eng. 53 (2000) 659-662.

DOI: 10.1016/s0167-9317(00)00399-3

Google Scholar

[4] Y. Luo, X. Wu, K. Wang, et al., Comparative study on the outgassing rate of materials using different methods, MAPAN-J. Metrol. Soc. India. 31 (2015) 61-68.

DOI: 10.1007/s12647-015-0160-2

Google Scholar

[5] N. H. Yang, D. Ba, X. D. Wang, et al., Harmful gas exhausting and clean vacuum acquiring, Vacuum. 41 (2004) 15-20. In Chinese.

Google Scholar

[6] Y. Z. Hu, Technique of clean ultra-high vacuum, Vacuum. 2 (1975) 1-39. In Chinese.

Google Scholar

[7] Z. J. Chen, Common contaminations in vacuum devices and their cleaning ways, Equipment for Electronic Products Manufacturing (Research and Application of new Technique). 137 (2006) 61-64.

Google Scholar

[8] D. Da, The design manual of vacuum, third ed., National defence industry press, Beijing, (2004).

Google Scholar

[9] Y. Tan, Cleaning treatment in vacuum technology, Vacuum. Cryogenics. 11 (1992) 169-173.

Google Scholar

[10] S. L. Ma, Y. L. Gong, X. H. Wen, A method of improvement of the ultimate vacuum in a stainless steel ultrahigh vacuum system, Vacuum. Cryogenics. 2 (1996) 78-80.

Google Scholar

[11] C. G. Yang, Research on the thermal properties at low temperatures and outgassing under vacuum condition of environmental friendly polyurethane foams (D), Shanghai Jiao Tong University, Shanghai, 2007, p.110.

Google Scholar

[12] X. M. Sheng, X. B. Wu, Y. Feng, et al., Experiment study of vacuum material outgassing rates, Appl. Mech. Mater. 303 (2013) 367-371.

Google Scholar

[13] Y. J. Cheng, D. T. Li, D. X. Zhang, et al., Composition analysis of residual gases in extremely high vacuum calibration chamber, Chinese J. Vacuum. Sci. Tech. 30 (2010) 54-59.

Google Scholar