Deposition of Tungsten-Doped V₂O₅ Thin Films on Non-Alkali Glass Substrate by RF Magnetron Sputtering for Thermal Insulation

Abstract:

The thermal insulation function of tungsten-doped vanadium dioxide (V₂O₅) thin films deposited on non-alkali glass substrate using RF magnetron sputtering was analyzed in this study. Grinded hot-dry V₂O₅ and tungsten powders, mixed in weight ratio of 98.1:1.9 or 97:3, were pressed at 800 psi for 10 min. These compounds were sintered at 550 or 600 °C for 8 hours, in oxygen gas environments (10 sccm and 0 sccm), to several W-doped V₂O₅ targets. The surface morphologies of these targets were analyzed by a SEM, and the crystal structure was characterized by a XRD. The experimental studies with reference to the thermal insulation property of V₂O₅ were conducted under various duration of deposition, substrate temperatures, rf powers and duration of annealing time. The influence of these factors was investigated using the Taguchi method, an orthogonal array L₈. The results show that the targets contain a more homogenous structure and a larger grain size with higher oxygen gas flow rate. With a deposition-parameter combination of 60 min (duration of deposition), 300°C (substrate temperature), 150 W (rf power) and 60 min (duration of annealing time), the optimal thermal insulation temperature, 19.3°C, was observed.

• Periodical: Key Engineering Materials (Volume 732)
• Pages: 16-23
• DOI: https://doi.org/10.4028/www.scientific.net/KEM.732.16
• Online since: March 2017
• Authors: Yue Fei Zhang, Chun Yao Hsu, Chih Chung Hu*
• Keywords: RF Magnetron Sputtering, Thermal Insulation, Thin Films, Vanadium Dioxide V₂O₅

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