Simulation of Ion Beam-Induced Collisional Processes in Thin Film Titanium Silicide

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Periodical:

Key Engineering Materials (Volumes 86-87)

Main Theme:

Edited by:

S. Hampshire, M. Buggy and A. J. Carr

Pages:

307-312

DOI:

10.4028/www.scientific.net/KEM.86-87.307

Citation:

M. O'Connor et al., "Simulation of Ion Beam-Induced Collisional Processes in Thin Film Titanium Silicide", Key Engineering Materials, Vols. 86-87, pp. 307-312, 1993

Online since:

July 1993

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$35.00

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