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HomeKey Engineering MaterialsKey Engineering Materials Vol. 860Electrodepositing Ni-TiN/Si3N4 Composite Layer...

Electrodepositing Ni-TiN/Si₃N₄ Composite Layer with Variation of Current Density

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Abstract:

Composite of two phases with crystal grains of titanium nitride (TiN) and amorphous of silicon nitride (Si3N4) had shown an improvement of mechanical properties as shown by composite layer of nickel (Ni) and TiN. In this study, Ni-TiN/Si3N4 composite layer on tungsten carbide bar have been prepared by using electrodeposition to study the effect of current density on the microstructure and mechanical properties of the layer. The optimum properties of composite coating with no crack morphology and maximum hardness was shown by the sample electrodeposited at current density of about 2.5 mA/cm2. The high hardness was attributed to the nickel crystallite size refinement

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Physics Symposium: Key Research in Materials Science

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Periodical:

Key Engineering Materials (Volume 860)

Pages:

320-326

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.860.320

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Online since:

August 2020

Authors:

Esmar Budi*, Yani Oktaviani, Achmad Fikry, Widyaningrum Indrasari, Iwan Sugihartono, Teguh Budi Prayitno

Keywords:

Current Density, Electrodeposition, Hardness, Microstructure, Ni-TiN/Si₃N₄ Composite

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© 2020 Trans Tech Publications Ltd. All Rights Reserved

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