Paper Titles

Plasma-Enhanced Metalorganic Chemical Vapor Deposition for High Temperature Superconducting Thin Film
p.457

Low Pressure and Low Temperature Synthesis of Diamond Films Using Magneto-Microwave Plasma CVD
p.465

Thermal Plasma Chemical Vapor Deposition
p.477

Thermally Sprayed Coatings for Electrical and Electronic Applications
p.497

ECR Plasma Etching Technology for ULSI
p.521

Evaluation of Substrate Degradation in Plasma Etch Processes Using Thermal Wave Analysis
p.541

Plasma Etching of Patterned Tungsten
p.565

Microwave Plasma Oxidation of Silicon
p.583

Hydrogen Interaction with Disordered Silicon
p.603

HomeMaterials Science ForumMaterials Science Forum Vols. 140-142ECR Plasma Etching Technology for ULSI

ECR Plasma Etching Technology for ULSI

Article Preview

Abstract:

You might also be interested in these eBooks

Plasma Properties, Deposition and Etching

Info:

Periodical:

Materials Science Forum (Volumes 140-142)

Pages:

521-540

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.140-142.521

Citation:

Cite this paper

Online since:

October 1993

Authors:

S. Samukawa

Export:

RIS, BibTeX

Price:

Permissions CCC:

Request Permissions

Permissions PLS:

Request Permissions

Сopyright:

© 1993 Trans Tech Publications Ltd. All Rights Reserved

Share:

Citation: