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HomeMaterials Science ForumMaterials Science Forum Vols. 140-142

Materials Science Forum Vols. 140-142

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.140-142

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Table of Contents

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Paper Title Page

Preface

PECVD of Silicon Dioxide from TEOS/Oxygen Mixtures

Authors: T.S. Cale, G.B. Raupp

1

Analysis and Design of Plasma Chemical Reactions Based on Quantum Chemical Methods

Authors: K. Sato

17

Advanced Simulation of Dry Etching Process Technology

Authors: J. Pelka

25

Anisotropic ECR Plasma Etching with Low-Energy Ions

Authors: Y. Tobinaga, T. Miyano, K. Fujimoto, M. Fujito, H. Fujiwara

39

High-Rate Sputtering with Electron Cyclotron Resonance and Electric-Mirror Excitation

Authors: Masaya Matsuoka

55

Modified ECR Plasma Deposition

Authors: S. Nakamura, Toshikazu Akahori, Satoshi Nakayama

79

DC Saddle-Field Plasma-Enhanced Vapour Deposition

Authors: R.V. Kruzelecky, S. Zukotynski

89

Theoretical Characterization of Electron Energy Distribution Function in RF Plasmas

Authors: M. Capitelli, G. Capriati, M. Dilonardo, C. Gorse, S. Longo

107

Ion Energy Distributions and Sidewall Profiles in Reactive Ion Etching

Authors: Paul W. May, David P. Field, D.F. Klemperer, Y.P. Song

121

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