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HomeMaterials Science ForumMaterials Science Forum Vols. 140-142

Materials Science Forum Vols. 140-142

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.140-142

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Paper Title Page

Preparation and Properties of PECVD Silicon Nitride Films from SiH₄ + NH₃ and/or NF₃ and SiF₄+ NH₃ Gas Mixtures

Authors: C. Gómez-Aleixandre, O. Sanchez, J.M. Albella

319

Bonding Configuration and Defects in Glow-Discharge Amorphous SiN_x:H Films Deposited at 300°C and 500°C

Authors: Shin Hasegawa, Y. Amano, L. He, T. Inokuma, Y. Kurata

335

Doped Glasses for ULSI-Technology: Integration of Molecular Engineering and Plasma-CVD

Authors: H. Treichel, J. v. Tomkewitsch, O. Spindler

359

Growth Processes and Defect Densities in Hydrogenated Amorphous Silicon Alloys

Authors: J. Robertson

381

Sputter Deposition of Thin Films for High Mobility Poly-Si TFT Fabrication

Authors: T. Serikawa

387

Ion Assisted Thin Film Growth in Dual Microwave/Radio Frequency Plasmas

Authors: L. Martinu, Michael R. Wertheimer

405

High Powered Pulsed Plasma Enhanced Deposition of Thin Film Semiconductor and Optical Materials

Authors: I.P. Llewellyn, K.J.A. Sheach, R.A. Heinecke

421

Plasma-Enhanced Chemical Vapour Deposition of Coatings in the System Ti-B-N

Authors: J. Laimer, H. Karner, H. Störi, P. Rödhammer

439

Plasma-Enhanced Metalorganic Chemical Vapor Deposition for High Temperature Superconducting Thin Film

Authors: Kenji Ebihara, Tomoaki Ikegami

457

Low Pressure and Low Temperature Synthesis of Diamond Films Using Magneto-Microwave Plasma CVD

Authors: J. Wei, H. Kawarada, Akio Hiraki

465

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