Paper Titles

Doped Glasses for ULSI-Technology: Integration of Molecular Engineering and Plasma-CVD
p.359

Growth Processes and Defect Densities in Hydrogenated Amorphous Silicon Alloys
p.381

Sputter Deposition of Thin Films for High Mobility Poly-Si TFT Fabrication
p.387

Ion Assisted Thin Film Growth in Dual Microwave/Radio Frequency Plasmas
p.405

High Powered Pulsed Plasma Enhanced Deposition of Thin Film Semiconductor and Optical Materials
p.421

Plasma-Enhanced Chemical Vapour Deposition of Coatings in the System Ti-B-N
p.439

Plasma-Enhanced Metalorganic Chemical Vapor Deposition for High Temperature Superconducting Thin Film
p.457

Low Pressure and Low Temperature Synthesis of Diamond Films Using Magneto-Microwave Plasma CVD
p.465

Thermal Plasma Chemical Vapor Deposition
p.477

HomeMaterials Science ForumMaterials Science Forum Vols. 140-142High Powered Pulsed Plasma Enhanced Deposition of...

High Powered Pulsed Plasma Enhanced Deposition of Thin Film Semiconductor and Optical Materials

Article Preview

Abstract:

You might also be interested in these eBooks

Plasma Properties, Deposition and Etching

Info:

Periodical:

Materials Science Forum (Volumes 140-142)

Pages:

421-438

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.140-142.421

Citation:

Cite this paper

Online since:

October 1993

Authors:

I.P. Llewellyn, K.J.A. Sheach, R.A. Heinecke

Export:

RIS, BibTeX

Price:

Permissions CCC:

Request Permissions

Permissions PLS:

Request Permissions

Сopyright:

© 1993 Trans Tech Publications Ltd. All Rights Reserved

Share:

Citation: