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Bonding Configuration and Defects in Glow-Discharge Amorphous SiN_x:H Films Deposited at 300°C and 500°C
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HomeMaterials Science ForumMaterials Science Forum Vols. 140-142Doped Glasses for ULSI-Technology: Integration of...

Doped Glasses for ULSI-Technology: Integration of Molecular Engineering and Plasma-CVD

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Plasma Properties, Deposition and Etching

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Periodical:

Materials Science Forum (Volumes 140-142)

Pages:

359-380

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.140-142.359

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Online since:

October 1993

Authors:

H. Treichel, J. v. Tomkewitsch, O. Spindler

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© 1993 Trans Tech Publications Ltd. All Rights Reserved

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