Plasma Enhanced Chemical Vapor Deposited Silicon and Silicon Dioxide Films for Indium Phosphide MISFET Technology

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Periodical:

Materials Science Forum (Volumes 140-142)

Edited by:

J. J. Pouch and S. A. Alterovitz

Pages:

285-300

DOI:

10.4028/www.scientific.net/MSF.140-142.285

Citation:

M. Shokrani and V.J. Kapoor, "Plasma Enhanced Chemical Vapor Deposited Silicon and Silicon Dioxide Films for Indium Phosphide MISFET Technology", Materials Science Forum, Vols. 140-142, pp. 285-300, 1993

Online since:

October 1993

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Price:

$35.00

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