Biased Electron Cyclotron Resonance Chemical-Vapor Deposition of Silicon Dioxide Inter-Metal Dielectric Thin Films

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Periodical:

Materials Science Forum (Volumes 140-142)

Edited by:

J. J. Pouch and S. A. Alterovitz

Pages:

255-268

DOI:

10.4028/www.scientific.net/MSF.140-142.255

Citation:

P. Shufflebotham et al., "Biased Electron Cyclotron Resonance Chemical-Vapor Deposition of Silicon Dioxide Inter-Metal Dielectric Thin Films", Materials Science Forum, Vols. 140-142, pp. 255-268, 1993

Online since:

October 1993

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$35.00

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