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HomeMaterials Science ForumMaterials Science Forum Vols. 140-142Biased Electron Cyclotron Resonance Chemical-Vapor...

Biased Electron Cyclotron Resonance Chemical-Vapor Deposition of Silicon Dioxide Inter-Metal Dielectric Thin Films

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Plasma Properties, Deposition and Etching

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Periodical:

Materials Science Forum (Volumes 140-142)

Pages:

255-268

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.140-142.255

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Online since:

October 1993

Authors:

P. Shufflebotham, M. Weise, D. Pirkle, D. Denison

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© 1993 Trans Tech Publications Ltd. All Rights Reserved

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