p.255
p.269
p.285
p.301
p.319
p.335
p.359
p.381
p.387
Preparation and Properties of PECVD Silicon Nitride Films from SiH4 + NH3 and/or NF3 and SiF4+ NH3 Gas Mixtures
Abstract:
Info:
Periodical:
Pages:
319-334
Citation:
Online since:
October 1993
Authors:
Price:
Сopyright:
© 1993 Trans Tech Publications Ltd. All Rights Reserved
Share:
Citation: