Preparation and Properties of PECVD Silicon Nitride Films from SiH4 + NH3 and/or NF3 and SiF4+ NH3 Gas Mixtures

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Periodical:

Materials Science Forum (Volumes 140-142)

Edited by:

J. J. Pouch and S. A. Alterovitz

Pages:

319-334

DOI:

10.4028/www.scientific.net/MSF.140-142.319

Citation:

C. Gómez-Aleixandre et al., "Preparation and Properties of PECVD Silicon Nitride Films from SiH4 + NH3 and/or NF3 and SiF4+ NH3 Gas Mixtures", Materials Science Forum, Vols. 140-142, pp. 319-334, 1993

Online since:

October 1993

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