Physical and Electrical Properties of Silicon Nitride and Oxynitride Films Prepared by Plasma Enhanced CVD

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Periodical:

Materials Science Forum (Volumes 140-142)

Edited by:

J. J. Pouch and S. A. Alterovitz

Pages:

301-318

DOI:

10.4028/www.scientific.net/MSF.140-142.301

Citation:

J. Vuillod "Physical and Electrical Properties of Silicon Nitride and Oxynitride Films Prepared by Plasma Enhanced CVD", Materials Science Forum, Vols. 140-142, pp. 301-318, 1993

Online since:

October 1993

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$35.00

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