Negatively Charged Particles in Fluorocarbon RF Etch Plasmas: Density Measurements Using Microwave Resonance and the Photodetachment Effect

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Periodical:

Materials Science Forum (Volumes 140-142)

Edited by:

J. J. Pouch and S. A. Alterovitz

Pages:

235-254

DOI:

10.4028/www.scientific.net/MSF.140-142.235

Citation:

M. Haverlag et al., "Negatively Charged Particles in Fluorocarbon RF Etch Plasmas: Density Measurements Using Microwave Resonance and the Photodetachment Effect", Materials Science Forum, Vols. 140-142, pp. 235-254, 1993

Online since:

October 1993

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$35.00

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