Paper Titles

Source of Atomic Oxygen and its Application to Material Oxidation
p.159

Practical Applications of In-Situ Plasma-Etching Diagnostic Techniques
p.171

Laser-Aided Diagnostics of Processing Plasmas
p.191

Radical Kinetics in Processing Plasmas: Optical Diagnostics of Gas Phase and Surface Reactions
p.219

Negatively Charged Particles in Fluorocarbon RF Etch Plasmas: Density Measurements Using Microwave Resonance and the Photodetachment Effect
p.235

Biased Electron Cyclotron Resonance Chemical-Vapor Deposition of Silicon Dioxide Inter-Metal Dielectric Thin Films
p.255

TEOS-Based Oxides: Deposition Dependent Properties
p.269

Plasma Enhanced Chemical Vapor Deposited Silicon and Silicon Dioxide Films for Indium Phosphide MISFET Technology
p.285

Physical and Electrical Properties of Silicon Nitride and Oxynitride Films Prepared by Plasma Enhanced CVD
p.301

HomeMaterials Science ForumMaterials Science Forum Vols. 140-142Negatively Charged Particles in Fluorocarbon RF...

Negatively Charged Particles in Fluorocarbon RF Etch Plasmas: Density Measurements Using Microwave Resonance and the Photodetachment Effect

Article Preview

Abstract:

You might also be interested in these eBooks

Plasma Properties, Deposition and Etching

Info:

Periodical:

Materials Science Forum (Volumes 140-142)

Pages:

235-254

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.140-142.235

Citation:

Cite this paper

Online since:

October 1993

Authors:

M. Haverlag, Akihiro Kono, G.M.W. Kroesen, F.J. de Hoog

Export:

RIS, BibTeX

Price:

Permissions CCC:

Request Permissions

Permissions PLS:

Request Permissions

Сopyright:

© 1993 Trans Tech Publications Ltd. All Rights Reserved

Share:

Citation: